Posted: December 9, 2009

Oxford Instruments Plasma Technology Receives Order from IMB Barcelona

(Nanowerk News) Oxford Instruments Plasma Technology (OIPT), leader in producing systems and processes for etch, deposition and growth, has recently received an order from IMB Barcelona for its System100 cluster platform with two ICP-RIE process modules. The systems will be used for Aluminium etching, one of Oxford Instruments areas of expertise.
The National Centre for Microelectronics (CNM) is the largest public microelectronics research and development centre in Spain, and comprises three Institutes, including the Instituto de Microelectrónica de Barcelona, IMB-CNM.
Dra. Ana Sánchez Amores from IMB Barcelona commented, "At IMB-CNM, our facilities include an Integrated Micro and Nanofabrication clean room and other complementary laboratories for microsystems processes, device packaging and electrical characterisation. The cleanroom facility of IMB-CNM includes equipment for micro and nanofabrication processes based on silicon technology, and we will be using the OIPT Systems here for our R&D. We chose OIPT Systems as a result of a public tender process where different items have been evaluated, namely technical and economical aspects, etch process expertise with proven Systems and level of customer support offered".
OIPT’s Sales and Customer Support Director, Mark Vosloo said, "Oxford Instruments' tools offer excellent uniformity and high-throughput processes on a range of applications. Our flexible cluster systems are suitable both for R&D such as the IMB cleanroom installation, and for Production applications, and are backed by our extensive process library. As leaders in the industry we are delighted our systems were chosen by this prestigious Institute."
Source: Oxford Instruments (press release)
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