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Posted: January 10, 2010
Nova Integrated Metrology for Etch Deployed by a Major Foundry in Asia Pacific
(Nanowerk News) Nova Measuring Instruments Ltd. provider of leading edge stand-alone metrology and the market leader of integrated metrology solutions to the semiconductor process control market, today announced that a major foundry in Asia Pacific has decided to deploy its NovaScan Integrated Metrology (IM) solution coupled with NovaMARS® shape profiling software, for 45nm gate Etch Advanced Process Control. The company expects additional tools to be ordered and installed during 2010 from this particular foundry.
"Foundries continuously deal with a large variety of products, combined with an ever increasing need to tighten process control and reduce process variability," commented Noam Shintel, Director of Corporate Marketing at Nova. "Our leading Integrated Metrology platform enables fast and accurate closed-loop control of the Etcher, resulting in higher yield and improved productivity for our customers. Expanding our product reach into more areas of the fab through a broadened product offering has become part of our strategy and we expect this trend to continue into the future".
The NovaScan integrated metrology platform is available in conjunction with Applied Materials, Lam Research and Ebara Corporation CMP and Etch tools. The platform provides a state-of-the-art metrology solution, implementing polarized normal incidence spectroscopic scatterometry with an extended UV and IR spectral range. NovaScan Integrated Metrology, featuring the highest fleet (tool-to-tool) matching and throughput, is an ideal and cost-effective metrology solution for the most demanding 2D, 3D, and in-die film thickness, Optical CD and shape profiling applications.
Nova Measuring Instruments Ltd. develops, produces and markets advanced integrated and stand alone metrology solutions for the semiconductor manufacturing industry.
Source: Nova Measuring Instruments (press release)