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Posted: April 13, 2010
Vistec Stepped into a Strategic Partnership with Huazhong University of Science and Technology
(Nanowerk News) Vistec Lithography, B.V. is pleased to announce today that it signed a strategic partnership agreement with the College of Optoelectronic Science and Engineering at the Huazhong University of Science and Technology in Wuhan, PR of China. The Huazhong University of Science and Technology (HUST) - a national key university in China and Vistec Lithography - a leading supplier of electron-beam lithography systems will collaborate in research and education of nanolithography.
The core of that project is the Vistec EBPG5000pES : electron-beam lithography system, which will enable the College of Optoelectronic Science and Engineering to enhance their research and education effectiveness for both their students and associated research partners. “With the new patterning system we are able to further strengthen our leading position in photonics and optoelectronics, which are the most powerful technologies of the 21 st century”, stated Prof. Miao Xiangshui and Prof. Zhou Wenli.
The Vistec EBPG5000pES : is a high-performance lithography tool based on reliable and well-proven system architecture. With its electron-optical column (TFE source) rated for acceleration voltages of 50 and 100kV, the system provides a spot size down to <2.2nm, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
“We are very proud to have been selected as a partner by the Huazhong University, HUST’s broad scientific audience and research network is indeed impressive”, said Erwin Mueller, Managing Director Vistec Lithography, B.V.. “With the EBPG5000pES’s field-proven reliability in leading edge Universities and Research Institutes all over the world and based on the comprehensive experiences of the Vistec : staff we are able to provide HUST a good basis to pursue their strategic research roadmap. We look forward to a further business expansion in China.”
About Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.