Posted: July 20, 2010

New Cold Field Emission Gun Enhances Ultrahigh Atomic Level Resolution of JEOL ARM200F Aberration-Corrected S/TEM

(Nanowerk News) JEOL USA is pleased to announce that a new Cold Field Emission Gun is now available for the atomic resolution analytical JEM-ARM200F Transmission Electron Microscope (TEM). The ARM200F, introduced in 2009, has set a new benchmark for advanced aberration-corrected S/TEM technology with the highest resolution commercially available in its class.
Now outfitted with the optional and field-retrofittable Cold FEG, the ARM200F's ultrahigh imaging resolution is guaranteed at 78 picometers with an energy resolution of 0.3 eV. The higher brightness and smaller source size of the Cold FEG produce a smaller, sharper electron probe with a dramatically larger probe current, resulting in enhanced atom-by-atom imaging and chemical analysis. Additionally, the narrow energy spread of the electrons emitted from the Cold FEG enables atomic resolution analysis of EELS fine structures, which can be used to determine such things as electronic properties. Ultra-high vacuum near the electron source assures high stability of the electron probe current while high electrical system stability of 10-7 maintains the very narrow energy spread of the electron probe.
"The addition of a cold FEG to the ARM family adds another arrow to the JEOL quiver for atomic scale imaging and characterization. This enhancement makes it possible to perform sub-Angstrom imaging and atomic column chemistry with accuracy, speed and ease never seen before," said Dr. Thomas Isabell, Director of the TEM Product Division at JEOL USA. The JEOL ARM200F electron column integrates the Cold FEG, S/TEM and Cs correction in an unparalleled, ultra-stable design. Superior shielding safeguards the ultrahigh-powered optics from airflow, vibration, acoustical, magnetic, electronic, and thermal interferences.
The first ARM200F with Cold FEG in the USA will be installed at Florida State University's Applied Superconductivity Center, housed in the National High Magnetic Field Laboratory.
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
JEOL USA, Inc., a wholly owned subsidiary of JEOL, Ltd., Japan, was incorporated in the United States in 1962. The company has 13 regional service centers that offer unlimited emergency service and support in the U.S.
Source: JEOL USA (press release)
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