Advantest Announces New CD-SEM Metrology Tool for Next-Gen Photomasks

(Nanowerk News) Advantest Corporation today announced availability of its new SEM-based Critical Dimension (CD) measurement system for next-generation photomasks and patterned media. The E3630 is fully compatible with Advantest's existing E3610/E3620 CD-SEM measurement systems and software, and boasts 30% improved linewidth repeatability.
As semiconductor device features continue to shrink, photomask patterning challenges have created new requirements for highly precise, stable metrology. Advantest's E3600 series of CD-SEM measurement systems is already in use by multiple leading semiconductor and photomask manufacturers.
The E3630 features a newly developed objective lens and ultra-low-vibration platform, enabling 30% higher linewidth repeatability compared to the E3610/E3620. This industry-best performance makes the E3630 ideally suited for measuring the critical dimension (CD) of the miniature-sized patterns on photomasks for EUV (extreme ultraviolet) and nanoimprint lithography. The tool is optimal for photomask development and manufacturing evaluation at the 22nm and 16nm production nodes.
About Advantest Corporation
A world-class technology company, Advantest is the leading producer of automatic test equipment (ATE) for the semiconductor industry and a premier manufacturer of measuring instruments used in the design and production of electronic instruments and systems. Its leading-edge systems and products are integrated into the most advanced semiconductor production lines in the world. The company also focuses on R&D for emerging markets that benefit from advancements in nanotech and terahertz technologies, and has recently introduced critical dimension scanning electron microscopes essential to photomask manufacturing, as well as a groundbreaking 3D imaging and analysis tool. Founded in Tokyo in 1954, Advantest established its first subsidiary in 1982, in the USA, and now has subsidiaries worldwide. More information is available
Source: Advantest (press release)
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