ETH Zurich Choose Vistec EBPG5200 for New Nanotechnology Center

(Nanowerk News) Vistec Lithography, Inc., a leading provider of advanced electron-beam lithography equipment today announced that it received an order from the ETH Zurich (Swiss Federal Institute of Technology), a world-renowned research university, for one of its Vistec EBPG5200 systems. The Vistec EBPG5200 ( will be installed in the new Nanotechnology Center, which is a unique, public private partnership between IBM Research Zurich and ETH Zurich.
ETH Zurich will focus on exploratory research aiming at nanotechnology applications as MEMS/NEMS, nanowires, Carbon-based devices, functional materials, optical interconnects, photonics and directed self-assembly, just to indicate the most prominent. According to the evaluation team, the primary reason the Nanotechnology Center selected the Vistec system is the advanced technology capabilities it offers. "Our multiple research applications require a high performance nano-patterning tool of superior flexibility, which is essential for extending our advanced R&D efforts", said the speaker of the evaluation team. "The Vistec EBPG5200 allows us to further expanding our ability to pursue both near-term and long-term projects."
The Vistec EBPG5200 is the latest version of the highly successive and field-proven EBPG electron-beam lithography tool series. The EBPG5200 system can be operated with 20, 50 and 100kV accelerating voltage and is equipped with a 50MHz pattern generator and full 20bit address technology. Thanks to further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to routinely generate structures less than 8nm on varying substrates sizes from piece parts of a few millimetres to full patterning across a 200mm diameter. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse "multi user environments".
"This order from an excellent research university such as ETH Zurich is the result of our ongoing efforts to further enhance the performance of our electron-beam lithography systems," said Rainer Schmid, General Manager at Vistec Lithography, Inc. "We are always committed to our customers and their challenging research tasks."
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA), within the Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).
Source: Vistec (press release)
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