Australian Institute welcomes Vistec Electron Beam Technology

(Nanowerk News) Vistec Lithography, Inc. a leading supplier of Electron Beam Lithography systems is pleased to announce the delivery and successful installation of the EBPG5000pES Lithography system at the newly established Melbourne Centre for Nanofabrication (MCN) in Australia. The MCN will be performing research in the areas of nanostructures and a wide range of other applications also associated with the nearby Australian Synchrotron.
The MCN is a collaborative initiative between the Victorian and Federal Government, the Commonwealth Scientific and Industrial Research Organisation (CSIRO), Monash University, the University of Melbourne, LaTrobe University, Deakin University, the Royal Melbourne Institute of Technology and Swinburne University.
"Our institute benefits from one of the most powerful nano-technology instruments", said Doctor Abid Khan, Senior Research Strategist and former Director of the Monash Institute for Nanoscience and Manufacture. "This investment ensures that we remain at the cutting edge of nano-research throughout the next decade and in many respects, the facility is the doorway to further success for engineers and scientists nationwide."
The EBPG5000pES is based upon reliable and well-proven system architecture. Its 100kV electron-optics provides a spot size down to <2.2nm, which enables nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, University type environments. Due to these features and its high degree of flexibility and user-friendly interface, the EBPG Series is appreciated worldwide in leading Research Centres and Universities with more than 80 systems shipped.
The machine will help the MCN to develop new technologies. "We will be able to write and etch features on surfaces in an extremely small size. This technique is used for applications such micro-texturing of surfaces, manufacture of micro and nano-fluidic devices and x-ray optical elements," Dr. Khan said.
Rainer Schmid, General Manager at Vistec Lithography Inc., comments on the successful Customer Acceptance Test: "We are proud, that all tests have been carried out successfully in a very short time and we now can refer to our first EBPG system in Australia." Having received several EBPG orders within the past year, the latest evaluation clearly indicates that Vistec's product family is the system of choice for the requirements of Universities and Research institutes. Schmid: "In the upcoming year we would like to continue our positive development and further strengthen our worldwide market position."
Melbourne Centre for Nanofabrication
The Melbourne Centre for Nanofabrication, the Victorian Node and headquarters of the Australian National Fabrication Facility (ANFF). It is a brand new multi-user research facility, operating the largest purpose-built cleanroom complex in the Southern Hemisphere. Drawing upon the wealth of knowledge within six Universities and CSIRO, MCN is uniquely placed in a thriving cosmopolitan world-centre enabling it to bridge the gaps between scientific disciplines and commercial needs.
MCN offers open access to leading edge, state of the art equipment and processes for all sectors of industrial, research and academic community, both local and global.
Current expertise is provided in the areas of advanced materials and biotechnology, leading to the development of a wide range of customised sensors, actuators, and devices applied to areas from biomedicine, and energy to nanoelectronics and the environment.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA), within the Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).
Source: Vistec (press release)
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