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Posted: Aug 04, 2011
Samsung Adopts UniFire Metrology Tool for Advanced Wafer Scale Packaging Development
(Nanowerk News) Nanometrics Incorporated, a leading supplier of advanced metrology systems, today announced that Samsung Electronics Co. Ltd. has accepted its UniFire™ 7900 metrology system for process control of advanced wafer scale packaging. The metrology tool successfully completed evaluation for development of through-silicon via (TSV) technology, projected to be a key enabling feature of next generation semiconductor device designs. Nanometrics' UniFire system has now been adopted by five of the top seven semiconductor manufacturers worldwide for wafer scale packaging for advanced TSV and micro bump process control.
"The UniFire tool with its flexible application base and state-of-the-art performance enables our advanced packaging development, especially for through-silicon via processes," said Dr. B.H Lee, Sr. Manager of the Metrology division at Samsung Electronics Co. Ltd. "With the UniFire, we not only obtain high precision measurements of critical via parameters such as depth and diameter, we also use the tool for applications such as three-dimensional automated review and thick film overlay. Such flexibility and best-of-breed capability translates into improvements in productivity and yield."
The UniFire tool offers customers a broad range of features to control micro bumps, redistribution layer(s) and TSV patterning, etch and deposition processes, including measurement of critical dimensions (CD), registration and depth/height/profile, as well as the ability to measure wafer bow/shape and film thickness.
"High precision measurements of TSV, micro bump, and redistribution processes are critical to enable high-yield DRAM devices for next generation wafer scale packaging," said Kevin Heidrich, Vice President of Marketing and Business Development at Nanometrics. "The UniFire offers a unique, non-destructive, 3-D metrology capability allowing full surface topography control while reducing the need for multiple, independent metrology tools. This capability makes it an indispensable tool to ensure a higher yielding, quality manufacturing process with reduced cost of ownership."
"The continued adoption of our UniFire system by market leaders such as Samsung is evidence of the tool's enhanced value for next-generation metrology applications," said Dr. Timothy J. Stultz, president and chief executive officer. "With products like UniFire, Nanometrics takes a leading position in solving the challenges of 3-D device development, giving our customers powerful feedback to control their manufacturing process."
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics' systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics' website is http://www.nanometrics.com.