DEK Showcases Cutting-edge Solutions for Printing Applications at Electronica India 2011

(Nanowerk News) DEK, the world's leading mass imaging equipment supplier, together with local agent Maxim SMT, will be showcasing its leading printing technologies at Electronica India 2011. Held from 13 to 16 September 2011 at Pragati Maidan in New Delhi, DEK's end-to-end solutions will include capital equipment, software, process support products as well as stencil manufacturing offerings.
Delegates can look forward to DEK's Horizon 03iX print platform, breakthrough ProActiv and Nano-ProTek technologies, award-winning VectorGuard® stencil technologies, as well as high-performance understencil fabrics and chemistries at Maxim SMT's booth located at hall 11, booth 1190.
DEK's Horizon 03iX printer offers manufacturers best-in-class performance with a comprehensive array of sophisticated features including optimized printer frame technology, fast product changeover, 2 Cpk print process capability and proven 6-sigma production performance. In addition, the print platform's flexibility allows customized configuration with productivity tools such as ProActiv, Cyclone, HawkEye and HD Grid-Lok.
A revolutionary printing technology, ProActiv enables next-generation components to be printed using only a conventional printing process with a single thickness stencil. While existing area ratio process rules limit conventional printing with smaller apertures, DEK's breakthrough ProActiv technology extends the print process window to a level that enables consistent printing of small apertures for 0.3mm CSPs and 01005 passives, delivering significant improvements in quality, yield and throughput.
Maximizing throughput advantage is critical and DEK's Cyclone understencil cleaning technology enables manufacturers to achieve this. With its unique bi-directional active cleaning and innovative five-stage cleaning head, the technology reduces total cleaning time by half compared to conventional cleaners.
As good prints are dependent upon good stencils, DEK has developed a highly-effective stencil nano coating to improve the performance of new and existing stencils. Simple, low cost and remarkably effective, DEK's Nano-ProTek is a unique, proprietary coating formula that renders the entire stencil surface fluxophobic. By preventing flux from wetting the stencil surface, while pulling with it metal particles across the web of the stencil, Nano-ProTek simply and cost-effectively helps to significantly improve first pass yield, increases stencil cleaning effectiveness and reduces cleaning frequency.
DEK's popular VectorGuard® stencil technologies also offer significant advantages over conventional stencil technologies. Reusable and recyclable, the frameless tensioning technology prioritizes operator safety, system rigidity and ease-of-use for ongoing print process optimization.
To further improve process performances and yield, DEK has also engineered a range of high-performance understencil cleaning fabric and ProXF solutions, and Magna-Print™ printer blade technology.
In addition to all these leading solutions that will be on display, delegates can look forward to DEK's unmatched customer support tools – all delivering on DEK's 'Expect More' philosophy.
About DEK
DEK is a global provider of advanced materials deposition technologies and support solutions including printing equipment platforms, stencils, precision screens and mass imaging processes used across a wide range of applications in electronics pre-placement subassembly, semiconductor wafer manufacture, and alternative energy component production. For more information, visit DEK at
Source: DEK (press release)
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