Vistec Provides ITME in Warsaw With a High-performance Electron-beam Lithography System

(Nanowerk News) Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced that the noted Institute of Electronic Materials Technology (ITME) in Warsaw purchased a Variable Shaped Beam system SB251 from Vistec. The advanced lithography tool will be used for research and manufacturing of various kinds of micro-optical and diffractive elements, new materials as well as masks for optical lithography.
As a leading research institute in Poland, ITME is working in the multidisciplinary area of research, development and manufacturing of materials, innovative devices and components for application in electronics, micromechanics and optoelectronics. "We selected Vistec's electron-beam writer to support our research, development and manufacturing efforts due to its high performance and flexibility. We anticipate that the new Vistec SB251 will significantly contribute to successfully meet our research and development agenda", said Dr. Zygmunt Luczynski, director of ITME. The decision was made as a result of a European tendering procedure.
The Vistec SB251 is a universal system, which has been designed for both direct write as well as mask making exposures. The system is capable of handling and exposing transparent & non-transparent materials, which are in use in semiconductor and optics applications. Equipped with a 50kV electron optics, an address grid of 1nm and an exposure platform with a stage travel range of 210mm x 210mm the system enables lithography below 50nm on various substrates from pieces up to 200mm wafers and 7inch masks. A Graphical User Interface (GUI) and fully automated cassette-to-cassette substrate handling allow the effective usage in a diverse, multiuser environment at Institutes like ITME. Furthermore the system features the data preparation software package ePLACE (provided by EQUIcon GmbH).
"With the Vistec SB251 our long term partner ITME receives an advanced electron-beam lithography system. Due to its high flexibility and reliability the SB251 is perfectly tailored to the diversified applications ITME is facing now and will be challenged with in the future", comments Wolfgang Dorl, General manager of Vistec Electron Beam. "We are very pleased that ITME placed the order with Vistec, which further continues our successful collaboration started more than 20 years ago."
ITME is a leading Polish Institute of multi-research to develop new materials and materials based on these innovative tools and components for applications in electronics, microsystems, optoelectronics, micromechanics, metrology, etc. High-tech materials, instruments and components developed at the Institute enable scientific collaboration with universities and research institutes, are published in Polish and international journals, offered to interested customers to implement their projects, implemented in the industry or used for short series production within the Institute. The ITME manufacturing technologies are being developed for single crystals of semiconductor materials, oxide crystals (optical, piezoelectric), super-pure metals, glass active. Nanotechnologies are widely used in studies of new materials such as photonic crystals, meta materials make it possible to produce super-pure materials, glass active fiber, photonic, a new (active and transparent) nano-ceramic and composite materials, which have unique properties in a wide range of applications.
The Institute developed epitaxial structures for electronic and optoelectronic devices, innovative lasers, photo detectors, sensors, filters, piezoelectric, diffractive lenses. The idea of single-crystal growth method invented by Prof. Jan Czochralski, (widely used in the world) is continued at the Institute. Development of this method, leads to the subsequent development of highly advanced technologies in a field of semiconductor and oxide single crystals. For more information see:
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Lithography and Vistec Electron Beam.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are accepted world-wide in advanced research laboratories and universities.
Source: Vistec (press release)
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