Posted: December 13, 2007

GenISys Builds 'Power Team' in Advanced Process Modeling

(Nanowerk News) Positioning itself for future growth and market leadership, GenISys GmbH, a provider of software for optimization of microstructure fabrication processes, today announced it has signed an agreement with the Fraunhofer Institute of Integrated Systems and Device Technology (IISB) for the development and licensing of advanced 3-D resist modeling techniques for e-beam and proximity lithography.
GenISys further announced that Nikola Belic, a leading pioneer in proximity effect correction (PEC) technology and developer of the widely used Proxecco PEC software, will join GenISys as senior development engineer, effective January 2008.
According to the terms of its agreement with Fraunhofer IISB, GenISys will integrate the 3-D resist modeling technologies developed by Fraunhofer IISB’s Lithography Simulation Group under the direction of Dr. Andreas Erdman into GenISys’ products for proximity lithography for microsystems and e-beam lithography, and market them. Insofar, GenISys will be the sole software house partner for IISB regarding distribution. Specifically, GenISys will adapt and integrate Fraunhofer’s 3-D resist modeling technologies into its Layout LAB mask-aligner lithography simulation software and its Layout BEAMER e-beam data preparation and PEC software.
As structures continue to shrink, absolute accuracy on the wafer becomes increasingly critical. Resist process effects have a major influence on the resolution of nanometer e-beam lithography, and standard proximity effect correction based solely on electron scattering is falling short. By combining modeling of writing strategy, electron scattering and resist effects, Layout BEAMER provides the most complete solution for model-based process correction and verification.
For MEMS and advanced packaging applications using mask aligner lithography (proximity printing), control of the 3-D resist profile is essential. Accurate 3-D simulation of the resist process enables process optimization and correction techniques, as proven over many years in advanced IC manufacturing using projection lithography. The addition of 3-D resist modeling will make Layout LAB the most effective simulation software for model-based optical process development, correction and verification (DfM technologies) for mask aligner lithography.
“We decided to leverage Fraunhofer’s almost 20 years of experience and proven expertise in resist modeling for advanced projection lithography honored by working with the industry’s leading IC manufacturers,” said Ulrich Hofmann, founder and general manager of GenISys. “With Fraunhofer’s proven 3-D resist simulation technology, our products will give our customers unprecedented accuracy for modeling and optimizing their layouts and processes. The full, 3-D model will help them to more effectively correct for the limitations of the exposure process. This, in turn, will enable them to cut development time and costs even more, so they can stay ahead of their competition by bringing the latest micro and nano products to market faster and more economically.”
“The research and licensing agreement with GenISys is an important step in the diversification of our research and development activities in lithography simulation,” said Dr. Andreas Erdmann, leader of Fraunhofer IISB’s Lithography Simulation Group. “Simulation has become an established and indispensable technique for the development and optimization of optical projection printing in semiconductor fabrication. The transfer and adaptation of our simulation models and algorithms to other lithographic methods and applications will help developers to understand the advantages and limitations of these microfabrication technologies and push them closer to their physical limits. With GenISys, we now have a very competent partner for the integration of our technology into a professional commercial software package for e-beam and mask aligner lithography.”
PEC Pioneer Nikola Belic Joins GenISys
Further enhancing GenISys’ product development resources, noted PEC software designer Nikola Belic will join GenISys’ power team as senior development engineer in January 2008. A pioneer in the creation of commercial e-beam proximity effect correction software, Belic is best known as the developer of the widely used Proxecco PEC software. At GenISys, Belic will focus on the development of advanced PEC and modeling for Layout BEAMER.
“We are delighted that Nikola has chosen to bring his unparalleled expertise in PEC to GenISys,” said Ulrich Hofmann. “As the leading developer behind Proxecco, Nikola brings a wealth of knowledge and insight into both the technology and the market. This is growing increasingly important as chip geometries continue to shrink, and chipmakers have to find new ways to build more features in less space. At GenISys, Nikola will have the opportunity to pursue new approaches and methodologies in technologies needed for next-generation devices.”
“Ten years ago, when I joined the development of the software Proxecco for proximity effect correction at AISS, the typical critical dimension (CD) was in the order of some 100nm,” said Nikola Belic. “The main issue at these dimensions was electron backscattering. At today’s dimensions, with only 10nm and CD uniformity specs of a few nanometers, more complex effects like resist processing and etching have come into focus.
The new challenge is that exposure and process effects have to be addressed simultaneously during data preparation. With the ever-growing design complexities, this imposes extremely high efficiency requirements on the applied correction algorithms. GenISys’ data preparation and Fraunhofer IISB’s modeling expertise complement each other perfectly. I am very excited to be joining the GenISys team for the development of advanced e-beam solutions."
About Fraunhofer IISB
The Fraunhofer Institute of Integrated Systems and Device Technology (IISB) is one of the currently 56 Fraunhofer Institutes in Germany that form Fraunhofer-Gesellschaft, the largest organization of applied research in Europe. The Lithography Simulation Group of Fraunhofer IISB has a long-standing history in this field. Almost 20 years ago, Wolfgang Henke, at that time at Fraunhofer IMT, started to develop algorithms for the simulation of lithographic projection printing processes. Today, the Lithography Simulation Group of Fraunhofer IISB led by Andreas Erdmann employs eight scientists and PhD students with various backgrounds in physics/optics, electrical engineering, and computer science. It is one of the worldwide leading research teams in the field of lithography modeling. Together with several academic and industrial partners, the group develops models, algorithms, and software for lithographic processes and applies them in research and development projects. The established simulation algorithms for optical projection printing are available via the development and research simulator Dr.LiTHO: The cooperation with GenISys will expand IISB’s application areas into e-beam lithography and proximity lithography for microsystems.
About GenISys
Based in Munich, Germany, and with offices in Tokyo-Japan and Los Gatos-USA, GenISys GmbH develops, markets and supports flexible, high-performance software solutions for the highly efficient processing of large layout data and the optimization of microstructure fabrication processes. Addressing the market for e-beam direct-write and optical lithography, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with high-caliber software engineering and a focus on ease of use. GenISys products give researchers, IC and MEMS manufacturers and system suppliers unparalleled efficiency, ease of use and optimal value in research, development and production of new micropatterning technologies.
As a company focused on customer service, GenISys delivers fast, flexible support for integration, customization and development of specialized functionality to meet unique customer needs. For more information on GenISys, visit our Web site at
GenISys is a registered trademark and Layout BEAMER is a trademark of GenISys GmbH. All other trademarks are the property of their respective holders.
Source: GenISys GmbH
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