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Posted: January 10, 2008
Nanotechnology company Beneq awarded first price in growth company competition
(Nanowerk News) Helsingin Sanomat, the largest daily newspaper in Finland, organized for a second time a ‘Future winners’ competition where most potential and successful young growth companies were searched for.
In the first phase of the competition a questionnaire was sent to Finnish venture capital investors and other professionals working with and knowing young growth companies. The participants of the questionnaire were asked to name the most potential growth companies, with a restriction that they were not allowed to vote any company in their own investment portfolio. An amount of 160 companies were mentioned in the answers. Those 10 companies having gained biggest amount of votes were published and presented in the newspaper.
A final round between the 10 companies was organized yesterday. All the finalists gave a short presentation in front of a public and a jury of 6 students from 3 top universities, Helsinki University of Technology, Helsinki School of Economics and University of Art and Design Helsinki.
The jury elected Beneq as the winner of the competition. In their comments the jury was strongly impressed by Beneq’s story where e.g. international customers and growth has been targeted from the very beginning.
Beneq management appreciates the award and emphasizes the importance of the highly skilled and motivated personnel behind the success.
A series of articles regarding the competition has been published in Helsingin Sanomat during the past week and the result and Beneq gained a lot of publicity in today’s . A good amount of material is also available in their www-pages www.hs.fi.
Beneq Oy, Vantaa, Finland, is a supplier of industrial equipment for global markets. Beneq is addressing the market of industrial equipment for producing functional surfaces with the latest technology, typically utilizing nanosize materials. Main products of Beneq include equipment and technology for nHALO® (Hot Aerosol Layering Operation) and ALD (Atomic Layer Deposition). ALD technology is a thin film coating method used to produce accurate, pinhole-free and conformal thin-film coatings on various substrates.