Measure Thickness and Composition of Thin Films with SEM EDS

Posted: July 16, 2008
Measure Thickness and Composition of Thin Films with SEM EDS
(Nanowerk News) Oxford Instruments NanoAnalysis introduces ThinFilmID for the in-situ measurement of composition and thickness of thin films down to 1nm in the SEM.
ThinFilmID uses Energy Dispersive X-ray Spectrometry (EDS) to measure the composition and thickness of layers in a thin film structure.
This technique has a unique combination of advantages that offer real benefits to customers both in terms of speed, optimisation of methods and ease of use. These benefits include:
Spatially resolved measurements – analyse a specific point on a sample Excellent nano-scale lateral resolution – controlled by the interaction volume and only few hundred nm at low kV Measure the composition and /or thickness of the layers Measures layers as thin as 2nm and as thick as 1000nm Measure structures with up to 7 layers plus substrate with up to 16 elements Unique Solvability and Simulation tool for simple optimization of data collection conditions Non-destructive technique with no need to cross-section structures Minimal sample preparation = time and cost savings Works with existing SEMs and INCAEnergy, no unique hardware is required
Visit www.oxford-instruments.com/thinfilmid for more information.

Source: Oxford Instruments

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