Posted: July 16, 2008 | |
Measure Thickness and Composition of Thin Films with SEM EDS |
|
(Nanowerk News) Oxford Instruments NanoAnalysis introduces ThinFilmID for the in-situ measurement of composition and thickness of thin films down to 1nm in the SEM. | |
ThinFilmID uses Energy Dispersive X-ray Spectrometry (EDS) to measure the composition and thickness of layers in a thin film structure. | |
This technique has a unique combination of advantages that offer real benefits to customers both in terms of speed, optimisation of methods and ease of use. These benefits include: | |
|
|
Visit www.oxford-instruments.com/thinfilmid for more information. |
Source: Oxford Instruments |
Subscribe to a free copy of one of our daily
Nanowerk Newsletter Email Digests
with a compilation of all of the day's news.
Nanowerk Newsletter Email Digests
with a compilation of all of the day's news.
These articles might interest you as well: