Posted: December 22, 2008

3M and EV Group Settle Patent Infringement Suit

(Nanowerk News) 3M and EV Group (EVG) have agreed to settle the patent infringement litigation brought by EVG against 3M in the U.S. District Court for the Southern District of New York relating to systems for temporary wafer bonding.
Under the terms of the settlement, the details of which are confidential, 3M, its customers, and 3Mís licensed suppliers of 3M's Wafer Support System will continue to make, sell and use the Wafer Support System in global semiconductor and packaging markets. EVG will continue to defend its patent portfolio and protect its intellectual property.
EV Group (EVG) is a world leader in wafer-processing solutions for semiconductor, MEMS and nanotechnology applications. Key products include wafer bonding, lithography/nanoimprint lithography (NIL) and metrology equipment, as well as photoresist coaters, cleaners and inspection systems. To protect the tremendous investment in research and development, which allows EVG to be at the forefront of setting new standards and bringing emerging applications to market, the companyís products and processes are covered by numerous patents. For more information, visit
Source: 3M (press release)
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