Posted: January 8, 2009

Samsung Electronics Orders Photomask Metrology System From Carl Zeiss

(Nanowerk News) Carl Zeiss SMT has received the next order for their Photomask Registration and Overlay Metrology System PROVE™ from Samsung Electronics, the Korean Integrated Device Manufacturer. The order was placed consecutively after a recent order from the leading e-beam mask writer supplier NuFlare.
“Considering the current market situation, this is a remarkable success. These orders clearly confirm that PROVE™ with its high resolution 193nm imaging optics is an enabling technology for mask manufacturing at 32nm node and beyond. For strategically operating companies, regardless of whether they are mask writer manufacturers, IDM or mask shops there is no alternative but to work with ZEISS registration technology if they want to meet and exceed their aggressive roadmaps.” states Dr. Oliver Kienzle, Member of the Board at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS).
The new metrology system PROVE™ was developed by a team of more than 40 Carl Zeiss SMT engineers and is supported by SEMATECH.
About Carl Zeiss SMT
As a innovation leader for lithography optics, as well as optical and particle-beam based inspection, analysis and measuring systems, Carl Zeiss SMT opens up new avenues for its customers in industrial manufacturing environments, quality assurance and industrial and university R&D. The basis for the success is its leading know-how in light, electron and ion-optical technologies. Together with its subsidiaries in Germany, England, France, Israel, Singapore and the USA, the international group of companies has more than 2,500 employees. In fiscal year 2006/07, Carl Zeiss SMT AG generated revenues of over EUR 1 billion. Carl Zeiss SMT AG is a wholly owned subsidiary of Carl Zeiss AG. Further information:
Source: Carl Zeiss (press release)
Subscribe to a free copy of one of our daily
Nanowerk Newsletter Email Digests
with a compilation of all of the day's news.
These articles might interest you as well: