The latest news from academia, regulators
research labs and other things of interest
Posted: February 20, 2009
Brion and Cymer Collaborate to Improve Computational Lithography Modeling
(Nanowerk News) Brion, a division of ASML, and Cymer Inc. today announced the successful incorporation of detailed Cymer laser spectral characteristics into Brion’s computational lithography models. Initial results show improvement in a significant portion of the model accuracy budget. This is the first time that this level of laser bandwidth characterization has been integrated into computational lithography products. The improved modeling will enable semiconductor manufacturers to produce more advanced chips.
The work utilizes Cymer’s factory-measured data, and underscores the importance of laser bandwidth stabilization technology and tuning. The modeling improvements to Brion’s OPC RET series of products benefit customers by increasing modeling accuracy. Brion’s new LithoTuner series of products for the fab are also enhanced with additional tuning flexibility.
“ASML and Cymer have a long history of successful partnerships,” said Ed Brown, president and chief operating officer of Cymer, “Our work with Brion extends those partnerships into computational lithography, allowing information about our advanced light sources to be applied to photomask manufacturing. We look forward to further collaborations in order to uncover new solutions for lithography optimization.”
“This helps our industry by allowing more accurate models and will be embedded into all our computational lithography products by mid-year 2009,” said Jim Koonmen, general manager at Brion. “At advanced semiconductor nodes, every nanometer counts. This new level of accuracy will improve lithography process control.”
This collaboration shows ASML and Cymer’s dedication to meeting advanced semiconductor manufacturing requirements for continuously improving accuracy. The results will be presented at the SPIE Advanced Lithography Conference on Tuesday, February 24, 2009.
Cymer, Inc. is the market leader in developing light sources, used by nearly every major chipmaker around the world as the essential light source for DUV lithography systems. With numerous offices worldwide and company headquarters in San Diego, Calif., Cymer’s newly launched products enable double patterning in an effort to facilitate 32nm lithography. The company is also leading the industry in the research, development and transition to extreme ultraviolet (EUV) lithography, sourced by laser-produced plasma. Cymer is committed to developing and introducing new technologies that reduce cost of ownership for chipmakers while simultaneously improving productivity. Additional information on Cymer may be found at www.cymer.com.
About Brion Technologies
Brion Technologies, an ASML company, is the industry leader in computational lithography for integrated circuits. Brion’s Tachyon™ platform, an OPC and OPC verification system, enables capabilities that address chip design, mask making and wafer printing for semiconductor manufacturing. Brion is headquartered in Santa Clara, California. For more information: www.brion.com or www.ASML.com.