SML Electron Beam Resist
- Price:
- Request a Quote
- Vendor:
- EM Resist Ltd
- Country:
- United Kingdom | Contact Details
-
The high performance SML resist is a novel polymer that has been specifically designed to answer the demands of the EBL community. It can be simultaneously patterned into high resolution and high aspect ratio patterns, even at low acceleration voltages and without the aid of proximity effect correction.
SML resist has been specifically designed to fit in with a standard PMMA process. No change in chemistry or process training is required.
Specifications
Very high resolution: < 10nm
Very high aspect ratio:
> 10:1 @ 30 kV
>50:1 @ 100 kV
Thickness: 30 nm – 2000 nm
Superior LER/LWR
Very straight sidewalls
Excellent surface adhesion (HMDS not required)
Excellent etch resistance
Do you require a sample?
Please visit www.emresist.com or email [email protected] to speak to our sales or applications team -
.png)
EM Resist Ltd. is specialised in developing materials used for lithography and nanofabrication applications. With over 20 years combined experience, we are continually developing the next generation of materials that will enable you to push forward in your research and development.
Can we help you?
Do you have a specific application or problem that you are trying to solve? Are conventional tools or materials not working for you? Let us know and we may be able to help. With our deep in house knowledge on electron beam lithography and close connection with our sister companies EM Analytical & EM Systems Support, we can help you design materials and tools specific for your application.
We have a full suite of nanofabrication tools that are available for one-off project work or complete proof of principle projects.
Visit company website
The contents of this site are copyright ©2005-2023 Nanowerk. All Rights Reserved.
