SiOx Photoresist
- Price:
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- Vendor:
- Applied Quantum Materials Inc.
- Country:
- Canada | Contact Details
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SiOx is a high purity, silsesquioxane-based semiconductor grade polymer applicable as a negative tone resist for electron beam patterns, EUV, nanoimprint lithography and Step and Flash Imprint Lithography (SFIL). It is readily soluble in non-polar organic solvents like methyl isobutylketone (MIBK), methyl siloxane and toluene for thin-film fabrication. Depending on the film thickness, a dense pattern with sub-10 nm half-pitch can be achieved. -
AQM is a world leader in the research, development and synthesis of metal-free, non-toxic, biocompatible silicon quantum dots and semiconductor nanostructures for a broad range of applications in sensing, energy, displays, security and bio-imaging.
AQM also sells Polymeric SiOx e-beam resist for semiconductor fabrication with linewidth resolution of <6nm.
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