Within the Institute, a modern cleanroom up to class 1 exists, enabling the application of various modern nanostructure technologies, for example molecular beam epitaxy (MBE), ion beam deposition (IBD). Different other deposition technologies and etching processes in combination with optical and electron beam lithogrophy provide a key feature for the development of optoelectronic devices and nanosystem applications.
Address: | Heinrich-Plett-Str.40 (INA) |
City: | Kassel |
State/Province: | |
Postcode: | 34132 |
Country/Region: | Germany |