Vistec Electron Beam GmbH provides leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, mask making as well as integrated optics and several new emerging markets.
Offers new culture and exposure systems for in vitro studies of gases or complex mixtures. The VITROCELL modules offer new possibilities for the characterization of the effects of airborne substances such as gases nanoparticles and complex mixtures.
A manufacturer of high performance instrumentation for scientific and industrial applications focused on new solutions for Optical and Scanning Probe Microscopy: SNOM (NSOM), Confocal Raman Microscopy, AFM, SPM, PFM.
The aim of XTREME technologies is the development, manufacturing, marketing and service of high power EUV sources for lithography and related applications in close cooperation with our parent companies. Extreme Ultra-Violet (EUV) lithography is the technology of choice to meet the needs of semiconductor industry in 2009 and beyond.
Surface functionalization by methods of micro- and nanopatterning become more and more important in many applications of the life science sector. Zell-Kontakt GmbH develops and improves polymer and glass products in the areas analytics, applied pharmaceutical research and functional genomics.