The company utilizes its proprietary knowledge of high performance lasers, high-voltage electronics, advanced adaptive optics and atmospheric and plasma energy interactions to develop cutting edge technologies to deliver innovative solutions for critical military missions.
Develops nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panels, solar photovoltaic cells, flexible electronics and energy efficient glass.
Applied Nanotools is a nanotechnology SME based in Edmonton, Canada that specializes in fabrication of membrane-based optical chips for X-ray and EUV applications. Our products include high-resolution Fresnel zone plates for X-ray focusing and several X-ray and EUV mask technologies that include nano-gratings and calibration standards. Applied Nanotools also provide state-of-the-art micro and nano-fabrication services to enable fast prototyping and testing of various custom nanotechnology projects. This includes the NanoSOI Process Technology (via CMC Microsystems) for fabricating NEMS and nano-photonic devices.
Specializes in thermionic and field emission cathodes, refractory materials and custom device systems. The company has capabilities to vapor deposit films for various applications, including low work function coatings and nanoscale electron sources.
Arcnano employs state of the art manufacturing technologies and processes in a wide variety of disciplines spanning clean room wafer scale fabrication, precision machined parts, complex materials and electronics to make sensors, systems and mission critical components. Arcnano serves the semiconductor, photonics, data storage, medical, military, aerospace, instrumentation, and national laboratory markets.
The company manufactures research-grade Atomic Layer Deposition (ALD) systems for a variety of coating applications . Our systems, such as the GEM-D2, are designed to deposit defect free resistive and emissive coatings that are perfectly uniform in thickness, even deep inside high aspect ratio (HAR) structures such as Microchannel Plates or Channel Electron Multipliers. The ability to deposit such high quality films on substrates with ultra-high aspect ratios is a key feature of ARRADIANCE systems.
Asahi Glass has developed a nanoscale film forming technology it is applying, among other things, to the manufacture of transparent conductive oxide (TCO) film for thin film silicon photovoltaic devices.
ASELTA is a privately funded French company providing software environment mostly for the e-beam market. A CEA-LETI spin-off, ASELTA has production customers benefiting from its technology. Its unique architecture allows customers to increase resolution, accuracy and reduce writing time for their e-beam equipment with a seamless plug-and-play environment.