Vistec Electron Beam GmbH provides leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, mask making as well as integrated optics and several new emerging markets.
XinRay Systems LLC is a joint venture between Siemens Medical Solutions and Xintek. The company develops and manufactures distributed x-ray sources for a broad range of applications including diagnostic medical imaging, homeland security, and industrial inspection. Its proprietary nanomaterial based field emission electron sources have superior emission properties including high emission current and long term stability.
The aim of XTREME technologies is the development, manufacturing, marketing and service of high power EUV sources for lithography and related applications in close cooperation with our parent companies. Extreme Ultra-Violet (EUV) lithography is the technology of choice to meet the needs of semiconductor industry in 2009 and beyond.
Zygo esigns, manufactures, and distributes high-end optical systems and components for metrology and end-user applications. ZYGO's metrology systems are based on optical interferometry measuring displacement, surface figure, and optical wavefront. Metrology and optical markets for end-user and OEM applications include semiconductor capital equipment, aerospace/defense, automotive, and research.