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Posted: Jul 16, 2014
Extreme nanostructures value proposition
(Nanowerk News) Current methods of producing nanoscale devices such as transistors are rapidly approaching their fundamental physical limit. To continue the drive toward smaller, faster and more powerful devices requires a completely new manufacturing technique. Super-critical fluid electro-deposition (SCFED) integrates well proven technologies to offer a disruptive, scalable approach to building metal and semiconductor nanostructures an order of magnitude smaller than is achievable using photolithography.
SCFED not only addresses the needs of the electronics industry, it is also a route to producing high quality nanostructured materials which can be exploited in a wide range of civil and defence and security applications. The flexibility and scalability of SCFED uniquely positions it to become the high technology device manufacturing technique of the future.
Technological advantages of SCFED:
The only scalable approach to manufacturing nanostructures on the 1-10 nm scale
Device and nanomaterial applications
Proven for both metal and semiconductor nanostructures
SCFED uses proof-of-concept and developmental test reactors to produce ever smaller and higher quality nanostructures. The SCFED programme also has access to the latest characterization technologies for demonstrating device performance. SCFED nanostructures can be tailored for a broad range of applications and the programme is positioned to develop these to meet the requirements of industrial partners.
SCFED nanostructures can be tailored for a broad range of applications and the programme is positioned to develop these within the context of an established interdisciplinary research programme to meet the requirements of industrial partners.
If you would like to know more about SCFED please contact Dr Kristian Thaller [email protected]