| Posted: March 21, 2010 |
Nanotechnology training: Learn how to write at the nanometer scale |
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(Nanowerk News) Electron Beam Lithography (EBL) is a technique used for the patterning of optical masks for semiconductor integrated electronic circuits as well as for writing high-resolution patterns on substrates. It is one of the key nanofabrication technologies for device manufacturing for a wide range of technological and research applications. This training session will provide an introduction to Electron Beam Nanolithography, including the following topics:
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Description of the electro-optical, mechanical and electronic components of the E-Beam tool
Discussion of electron-solid interaction concepts such as forward scattering, backward scattering, proximity effects, and correction techniques
Demonstration of sample and data processing including fabrication protocols for E-Beam lithography exposure
Introduction to various E-Beam lithography software packages
ISO 5 (Class 100) cleanroom practice and lab demonstration
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This 9-hour training session, which involves 6 hours of classroom time and 3 hours of hands-on experience and lab demonstration, is required preparation for those who wish to use the University of Toronto Electron Beam Nanolithography Facility.
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By the end of the training session, participants will have designed and written a nano-device.
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Handouts will be provided.
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Target Audience: Graduate students, upper year undergrads, and others in academia or industry with a degree in engineering, physics, applied sciences, or life sciences.
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Prerequisites: There are no prerequisites, although semiconductor microfabrication experience is helpful.
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Schedule: Wednesday, April 21, April 28 and May 5 -- 1 to 3 p.m.
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Cost: $200 (academic); $400 (industry)
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Instructor: Dr. Aju Jugessur
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For more information about the training, please contact [email protected].
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