Posted: March 21, 2010 | |
Nanotechnology training: Learn how to write at the nanometer scale |
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(Nanowerk News) Electron Beam Lithography (EBL) is a technique used for the patterning of optical masks for semiconductor integrated electronic circuits as well as for writing high-resolution patterns on substrates. It is one of the key nanofabrication technologies for device manufacturing for a wide range of technological and research applications. This training session will provide an introduction to Electron Beam Nanolithography, including the following topics: | |
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This 9-hour training session, which involves 6 hours of classroom time and 3 hours of hands-on experience and lab demonstration, is required preparation for those who wish to use the University of Toronto Electron Beam Nanolithography Facility. | |
By the end of the training session, participants will have designed and written a nano-device. | |
Handouts will be provided. | |
Target Audience: Graduate students, upper year undergrads, and others in academia or industry with a degree in engineering, physics, applied sciences, or life sciences. | |
Prerequisites: There are no prerequisites, although semiconductor microfabrication experience is helpful. | |
Schedule: Wednesday, April 21, April 28 and May 5 -- 1 to 3 p.m. | |
Cost: $200 (academic); $400 (industry) | |
Instructor: Dr. Aju Jugessur | |
For more information about the training, please contact [email protected]. |
Source: University of Toronto |
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