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Posted: December 15, 2008
11-megapixel micro-mirror array for high-end industrial applications
(Nanowerk News) At
today's IEEE International Electron Devices Meeting, IMEC presented a
monolithically integrated 11-megapixel micro-mirror array for high-end
industrial applications -- a world's first both in terms of pixel density
and reliability. Each mirror in the array is 8µm x 8µm and can be
individually tilted by the high-speed integrated CMOS circuitry underneath
the array. This device fits in IMEC's CMORE initiative, which offers
cost-effective solutions for continued system scaling, not by shrinking
CMOS but by focusing on monolithic co-integration of heterogeneous
IMEC's 10cm” 11-megapixel mirror array has a pixel density that is almost
double that of comparable state-of-the-art micro-mirrors. And IMEC has
demonstrated that its mirrors show no creep and meet 10-to-the-12th-power
cycles mechanical lifetime. Integrated micro-mirror arrays such as this one, are
used in, for example, video projection or lithography mask writers.
Top view of individual mirrors and hinges (Image: IMEC)
IMEC fabricated the 8µm mirrors on top of foundry high-voltage 0.18µm CMOS
200mm wafers with 6 interconnect levels. The array was built using IMEC's
proprietary SiGe-based MEMS platform, meeting the mirror's mechanical
reliability requirements, device flatness, and compatibility with
high-speed CMOS. Poly-SiGe was chosen as structural material for the
mirrors, instead of Al. Poly-SiGe solves many of the reliability issues of
Al-based mirrors, and it is compatible with above CMOS processing, allowing
a smooth integration with the CMOS chip below.
IMEC's CMORE initiative offers cost-effective solutions for monolithic
co-integration of heterogeneous technologies. The services offered range
from development-on-demand, over prototyping, to low-volume production.
These services profit from the expertise in many research areas available
at IMEC. The CMORE solutions are implemented in IMEC's 200mm fab with
advanced packaging capabilities, such as 3D integration. The two process
platforms involved are a 0.13µm CMOS process and a versatile SiGe above-IC
MEMS process. On customer demand, the CMORE solution can be migrated to
IMEC's 300mm fab.
IMEC is a world-leading independent research center in nanoelectronics and
nanotechnology. IMEC vzw is headquartered in Leuven, Belgium, has a sister
company in the Netherlands, IMEC-NL, offices in the US, China and Taiwan,
and representatives in Japan. Its staff of more than 1650 people includes
more than 500 industrial residents and guest researchers. In 2007, its
revenue (P&L) was EUR 244.5 million.
IMEC's More Moore research aims at semiconductor scaling towards sub-32nm
nodes. With its More than Moore research, IMEC looks into technologies for
nomadic embedded systems, wireless autonomous transducer solutions,
biomedical electronics, photovoltaics, organic electronics and GaN power
IMEC's research bridges the gap between fundamental research at
universities and technology development in industry. Its unique balance of
processing and system know-how, intellectual property portfolio,
state-of-the-art infrastructure and its strong network worldwide position
IMEC as a key partner for shaping technologies for future systems.
Further information on IMEC can be found at www.imec.be.