The International Brain Mapping and Intraoperative Surgical Planning Society (IBMISPS) has recognized GE Healthcare with the Society's 'Pioneer in Technology' award, rewarding GE's leading role in the development and commercialization of image-guided technologies in healthcare.
Any foreign applicant, any foreign company can file an application and receive financing under the same conditions as Russian companies according to Dr. Leonid Melamed, director of the Russion Corporation of Nanotechnologies (RCNT).
Cyrium Technologies, a developer of high efficiency multi-junction solar cells for concentrator photovoltaic systems, announced that the firm has closed a Series B round of funding for a total of $15 million.
The long standing research collaboration between Hitachi and the Cambridge University has been enhanced with the installation of three state of the art scanning electron microscopes. The new facility will make some of Hitachi's unique instruments, including the S-5500 in-lens SEM, openly accessible to university researchers.
Following the introduction of the AFM height calibration standards HS-100MG and the HS-20MG, BudgetSensors, the Bulgarian manufacturer of silicon and silicon nitride probes, as well as AFM accessories for Atomic Force Microscopes, announces the commercial introduction of third type of AFM height calibration standard - the HS-500MG.
Hitachi Ltd and Hokkaido University prototyped an electron analysis microscope that produces an enlarged image by irradiating an electron beam from a scanning electron microscope (SEM) to a specimen and analyzing the diffraction pattern of the scattered light.
The National Institute of Standards and Technology (NIST) will use SouthWest NanoTechnologies Inc.'s SWeNT SG65 single-wall carbon nanotubes, manufactured by the CoMoCAT process, as the starting material for a Standard Reference Material.
Surface Technology Systems and XACTIX announced the immediate availability of a new Chemical Vapor Etch module for xenon difluoride gas. XACTIX and STS have cooperated to create a breakthrough chamber design and improved wafer handling to ensure the high throughput, uniformity, efficiency and uptime required to make XeF2 a viable process for high volume production.
Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices, today announced it received multiple orders from one of the largest memory manufacturers in the world for its AP300 advanced-packaging lithography tool.