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Veeco IBD System Achieves Breakthrough Defect Reduction in EUV Mask Blanks

Veeco Instruments Inc. announced today that SEMATECH, a global semiconductor consortium that conducts research and development to advance chip manufacturing, has recently achieved a major breakthrough using Veeco's NEXUS Low Defect Density Ion Beam Deposition (LDD IBD) System to significantly reduce defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL).

Sep 14th, 2012

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Tecan and Siloam Biosciences Co-market New ELISA System

The system is based on Tecan's Freedom EVO liquid handling technology and the Siloam Biosciences' OptiMax microplate. It offers rapid, sensitive and specific chemifluorescence-based ELISA procedures using exceedingly small sample volumes.

Sep 11th, 2012

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