Maryland Gov. Martin O'Malley has appointed Peter Searson and Steve Desiderio, two researchers from The Johns Hopkins University, to serve on a special task force to study the benefits of nanobiotechnology.
A new approach to building an 'artificial nose' - using fluorescent compounds and DNA - could accelerate the use of sniffing sensors into the realm of mass production and widespread use, say Stanford chemists.
For their look into the nanoworld, researchers used a scanning tunneling microscope. Its thin metal tip scans the specimen surface like the needle of a record player and registers the atomic irregularies and differences of approximately one nanometer with minuscule electric currents.
nfrastructure Technologies is the first company to sign on to the Assembly's inter-regional nanotechnology-partnership initiative. The company will occupy a newly created space at SUNYIT; planning of which is underway.
Leading scientists from neuroscience, nanoscience, astrophysics, computer science and engineering are gathering to discuss this question in Tromso, Norway, continuing a dialogue that began at last year's Kavli Futures Symposium.
A record number of 16 papers with imec authors has been accepted for this year's IEEE International Electron Devices Meeting (IEDM), being held Dec 6 - 8 in San Francisco. Both ITRS-related as well as More-than-Moore-related research papers have been accepted.
These workshops brief participants on what is nanotechnology and manufactured nanomaterials, what are some of the potential risks from nanotechnologies and manufactured nanomaterials (e.g. to the environment or human health) and benefits (e.g. decreased costs of low-maintenance products, or use in environmental remediation) of nanotechnology and nanomaterials.
Technology World in partnership with UK NanoForum will bring over 350 senior international delegates together with the best of the UK's Science and Technology community. With a focus on trade, investment and collaborations, this will be a networking forum for industry, academia, technology purchasers and those seeking to develop joint ventures and future partnerships.
An all-day special session on a roadmap for maskless lithography R+D and a keynote presentation offering insights on how to be successful in the photomask industry will highlight the SPIE Photomask Technology symposium next month in Monterey, California.
Using a new technique, researchers from imec, TU Vienna, and Infineon have shown that both electron and hole capture and emission times in SiO2 and HfO2 dielectrics are strongly thermally activated. The new technique, Time Dependent Defect Spectroscopy (TDDS), can be used to study the capture and emission times of single oxide defects over a very wide time range.
Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes use of PVx2 sensor wafers. For ion-assisted etch processes, the use of this PVx2-based method for ERU tuning results in lot-turn time savings of up to 80% compared to conventional etch rate uniformity tests.