Posted: June 30, 2008

ANSI participates in sixth ISO nanotechnology plenary

(Nanowerk News) May 26-30, 2008, marked the sixth plenary session for the International Organization for Standardization (ISO) Technical Committee (TC) 229 on nanotechnologies. Over 125 representatives from thirty member countries – including participants from South Africa, India, and the Russian Federation – gathered in Bordeaux, France to advance the committee’s goals in nanotechnology standardization.
The United States delegation, led by Dr. Clayton Teague, director of the National Nanotechnology Coordination Office, included sixteen representatives from the industry, government, and legal arenas. It was the largest delegation that the U.S. has sent thus far to a TC 229 Plenary.
Across the board, the United States participates actively in the work of ISO/TC 229 and its subsidiary bodies. National input is developed by the U.S. Technical Advisory Group (TAG) to ISO/TC 229, a group that is accredited and administered by the American National Standards Institute (ANSI).
Significant outcomes from the week-long TC 229 Working Group meetings included finalization for the TC to publish a technical report out of Working Group (WG) 3, Health and safety practices in occupational settings relevant to nanotechnologies, whose work efforts are led by the U.S.
Vladimir Murashov, special assistant on nanotechnology to the director of the National Institute for Occupational Safety and Health (NIOSH), is the project leader for this initiative.
"This Technical Report, which builds on NIOSH guidance, represents a major milestone toward responsible development of nanotechnology and is expected to be widely adopted as a foundation for national nanotechnology occupational safety and health programs around the world," said Murashov.
TC 229 also agreed to move forward with the publication of the first technical specifications from WG 1, Terminology for Nano-objects: Nanoparticles, Nanoplates, and Nanofibres. These two publications are the first work items from the Committee to complete the processes for publication of an ISO document.
“I want to extend my high commendations to Dr. Murashov for his strong leadership in moving the NIOSH document through the ISO process,” said Dr. Teague, who serves as chair of the U.S. TAG to ISO/TC 229. “The U.S. delegates on WG 1, Terminology and Nomenclature, are also to be commended for their excellent contributions to the first ISO technical specification on terminology. They were instrumental in bringing this document into alignment with the overall taxonomy adopted by WG 1.”
The next TC 229 meeting will be held from November 17-21, 2008, in Shanghai, China.
For more information about U.S. involvement in ISO nanotechnology standardization, visit or contact Ms. Heather Benko, manager of ANSI nanotechology standardization activities (212.642.4912; [email protected]).
Source: ANSI
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