Technologies and Devices International, Inc. (TDI), part of the Oxford Instruments Group, today announced it has been awarded $600,000 by the Maryland Energy Administration to help industry expedite the broad adoption of energy-efficient LED lighting.
Manhattan Scientifics Inc., a nanomedicine technology transfer and commercialization pioneer, today announced completion of its agreement to acquire all commercial rights to the body of work of nuclear physicist Edward R. Flynn, PhD and his company, Senior Scientific LLC.
The integration of new Viscotek product pages within the Malvern website highlights how gel permeation chromatography/size exclusion chromatography (GPC/SEC) technology enhances the company's ability to deliver insightful, information-rich material characterization solutions for the broadest range of industries.
One system was purchased by a new customer for the development of next generation advanced high-k metal gates, while the second is a repeat order from an existing customer planning to use Pulsar in its 32 nm high-k manufacturing ramp. Both tools include multiple Pulsar high-k reactors.
Concentrix Solar, a leading supplier of Concentrator Photovoltaic (CPV) systems and a new division of the Soitec Group (Euronext Paris), the world's leading supplier of engineered substrates, announced today that it has signed a contract with Chevron Technology Ventures for the deployment of a one megawatt (MW) CPV power plant to be installed at a Chevron Mining facility in Questa, New Mexico, USA.
This project to manufacture innovative drugs combating age-related diseases is based on pioneering work by V.P. Skulachev, member of the Russian Academy of Sciences and director of the A.N. Belozersky Research Institute of Physico-Chemical Biology.
ALLVIA, the first through-silicon via (TSV) foundry, has integrated embedded capacitors on Silicon Interposers, a key interface between a silicon device and an organic substrate needed for managing high interconnect densities.
The TEL team will work alongside SEMATECH engineers at CNSE's Albany NanoTech Complex to advance extreme ultraviolet lithography (EUVL) and related infrastructure - including mask defect reduction, mask metrology, source, resist processing, etch, and overall manufacturability and extensibility of the technology.
The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that six additional companies spanning the entire semiconductor value chain have joined the Initiative to support the new DFEB mask roadmap for high-volume applications.