Porvair Filtration Group has announced that it will unveil, at Pittcon 2009 (Booth 3877), a new range of innovative, solid-state sample preparation products enabling life scientists to accelerate the purification of biological molecules and materials.
NanoDynamics, Inc. announced that its subsidiary, NanoDynamics Energy, has received a one-year, $1.78 million grant from the Office of Naval Research to develop an innovative solid oxide fuel cell (SOFC) system that will be used as a main power source for tactical unmanned aerial vehicles (UAVs).
Cambridge Research and Instrumentation, Inc (CRi) and VisEn Medical announced today that they have signed a non-exclusive agreement to enable CRi to distribute VisEn's proprietary portfolio of fluorescent imaging agents and labels in North America.
Mentor Graphics Corporation announced today it will supply Freescale Semiconductor with select electronic design automation (EDA) technologies designed to enhance the manufacturability and testability of semiconductors.
In an effort to combat the near epidemic levels in HSV in the world, Concurrent Analytical Inc. was recently selected by the National Science Foundation (NSF) to modify its current Ramanprobes system for use in detecting both types 1 and 2 in a high speed, low cost platform capable of quantifying HSV levels critical to diagnosis.
NanoMarkets, an industry analyst firm, today announced that it will be conducting a webinar titled, Organic Photovoltaic Materials Opportunities that will take place on Tuesday, March 17th at 10:00 EST.
NanoSight, the UK nanoparticle characterization company, announces the release of a new super-sensitive system to compliment their range of instruments for imaging and sizing nanoparticles in liquid suspension.
The high performance controller enables precise laser alignment in critical applications including advanced scientific research, semiconductor metrology and lithography, material processing, medical diagnostics and surgery, and aerospace and defense systems.
The leading provider of stamps for nanoimprint lithography, NIL Technology, and IMS Chips, announced at the NILCOM meeting, January 8th, in Schaerding, Austria that they have started a collaboration on the fabrication of stamps for nanoimprint lithography (NIL) by combining their electron beam lithography (EBL) expertises.