Posted: September 15, 2009

Fraunhofer initiates and leads new EU project on highly ionised pulse plasma processes

(Nanowerk News) The Fraunhofer Institute for Surface Engineering and Thin Films IST has successfully initiated a COST Action on the subject of "highly ionised pulse plasma processes - HIPP processes" and now takes the lead of the action.
COST stands for: "European Cooperation in the field of Scientific and Technical Research" and is the oldest and most extensive European network program for the coordination of nationally supported research activities.
The actionís objective is the investigation and industrialization of new highly ionised pulse plasma processes, like High Power Impulse Magnetron Sputtering (HiPIMS). The enormous potential of the technologies with regard to the sustainable modification of layers (higher density, hardness, refractive index, modification of layer structure, amongst others) shall be opened up, i.e. investigated, upgraded and made ready for production.
A European board of experts coordinates the action. By specialized working groups, the world-wide networking of scientists working in the relevant field is strengthened, varying expertises are exchanged, and complementary procedures implemented. Dr. Ralf Bandorf from the Fraunhofer IST in Braunschweig is Chair of the Action.
Contact for further information:

Dr. Ralf Bandorf

Fraunhofer Institute for Surface Engineering and Thin Films IST

Bienroder Weg 54 E, 38108 Braunschweig, Germany

Phone: +49 531 2155-602, Fax: +49 531 2155-900

[email protected]

Source: Fraunhofer IST
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