| Posted: February 23, 2009 |
SEMATECH SPCC 2009 to focus on solutions for emerging technologies in semiconductor surface preparation |
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(Nanowerk News) SEMATECH announced today that its Surface Preparation and Cleaning Conference (SPCC), the premier technical forum for discussion of the latest innovations in wafer and mask-cleaning technologies, will be held on March 23 – 25, 2009 at the Sheraton Hotel in Austin, Texas. The conference will focus on material and process solutions to key challenges faced by the industry in emerging areas such as III-V materials, MuGFETs, MEMS, photovoltaics, Environment, Safety and Health and 450 mm.
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“This year’s conference is the only major event in the U.S. dedicated solely to seminal developments in advanced wafer and mask cleaning and surface preparation technologies for the 32 nm node and beyond,” said Joel Barnett, SEMATECH’s conference chair. “During these uncertain times it is more important than ever to bring together experts from the industry and researchers from the university community to share the latest innovations in wafer and mask-cleaning technologies.”
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The SPCC features two full days of leading-edge presentations from the semiconductor industry's major manufacturers and researchers from around the world, including:
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Gate dielectric interface research and challenges on III-V materials for future high speed, low power logic applications - presented by Dr. Niti Goel, Intel Assignee to SEMATECH
Surface process issues with MuGFETs devices – presented by Dr. Rusty Harris, Texas A&M University
Overview of Wet Clean and Etch Applications in Solar Photovoltaics - presented by Dr. Steven Verhaverbeke, Applied Materials
Cleaning problems associated with MEMS relays – presented by Dr. David Czaplewski, Sandia
The 450mm Transition: Progress, Plans, and Challenges – presented by Tom Jefferson, ISMI
Plasma Dry Cleaning – presented by Prof. Geun Young Yeom, Sungkyunkwan University
Integrating Green into Clean – presented by James Beasley, ISMI
Wet Chemical Treatments for Gallium Arsenide: A Spectroscopic Ellipsometry Study - Dr. Srini Raghavan, University of Arizona
CMP process; its challenges and future – presented by Dr. Jin-Goo Park, Hanyang University
ITRS FEP 2008 Update: The Impact of Shifts in Technology and Physical Gate Length to the FEP Roadmap - Dr. Jeff Butterbaugh, FSI International, Inc.
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To register or for more information, including an updated conference schedule, visit: http://www.sematech.org/meetings/spcc/index.htm.
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The SPCC is a key offering in the SEMATECH Knowledge Series, a set of public, single-focused industry meetings designed to increase global knowledge in key areas of semiconductor R&D. To see a complete listing of all the meetings in this series, go to www.sematech.org/meetings/sks.htm.
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