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R&D Engineer Thin Film Deposition of Ferroelectrics
Employer: imec
Location: Leuven, Belgium
Website: https://www.imec-int.com/en/home
Employment Start Date: As soon as possible

Organization Description:
Imec performs world-leading research in nano-electronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven (Belgium) and has offices in the Netherlands, US, Taiwan, China, India and Japan. Its staff of more than 2,086 people includes over 750 industrial residents, guest researchers and scholarships. We offer you a challenging position in an advanced high-tech environment, in an international and multicultural team. This is your opportunity to contribute to technologies that will have an impact on tomorrow’s society. We offer you an attractive salary added with competitive extra-legal benefits such as an interesting life insurance, hospitalization insurance, long term disability insurance and a pension plan. Imec takes on the full cost of these insurances. On top of that you receive meal vouchers for each working day. Imec offers various training possibilities and social services such as a company restaurant, ironing service, the possibility of day care nearby, holiday daycare and discounts in different sport clubs and shops. To decrease our ecological footprint 100% of the transport by train is reimbursed by imec.
Job Description:
For several decades, semiconductor logic and memory performance has been boosted by dimensional. The introduction of new materials and the exploration of alternate device concepts plays a critical role towards future technological advancements. One of the exiting new topics is the assessment of ferroelectric materials as the functional layer in future devices; one example is the polymorphic material HfO2. Since several years HfO2 has been used as gate dielectric, the heart of a logic transistor, but has recently been rediscovered as a ferroelectric material, when present in its orthorhombic phase. The specific phase requirements of a material and the subsequent impact on its performance demonstrates the necessity of material engineering and proper understanding to ensure optimal device performance. You will be part of the Thin Films group that is responsible for the development, characterization and optimization of deposition processes for dielectrics and metals. You will be responsible for the deposition and characterization of novel dielectric materials. You will work closely together with other process and integration groups to define the required specifications and to enable the integration of these materials. You will compare material candidates and potential deposition processes, understand their process window and application space. As a project owner, you will be responsible for the proper definition of milestones, time lines, resources, and ensure the timely execution of the project.
Requirements:
- You have a PhD degree in Chemistry, Physics, Materials Science or Engineering. - You’re an enthusiastic team player. - You have an analytical mind, use a logical and well-structured approach, but can also think outside the box. - You have a thorough understanding of material structural analysis and the correlation with materials properties. - You are used to work with deadlines and can handle stress. - Knowledge of atomic layer deposition is a plus. - Knowledge of semiconductor process technology is a plus. - Good English communication skills are required.
Job Application:
https://imec.csod.com/ats/careersite/login.aspx?returnurl=/ATS/CareerSite/ApplicationStart.aspx?ID=931&c=imec&site=7
Date Posted: June 28, 2017