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Cat brain: A step toward the electronic equivalent

University of Michigan computer engineer Wei Lu has taken a step toward developing this revolutionary type of machine that could be capable of learning and recognizing, as well as making more complex decisions and performing more tasks simultaneously than conventional computers can.

Posted: Apr 14th, 2010

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New method for recovering pricey nanoparticles

Scientists are reporting first use of a new method that may make it easier for manufacturers to recover, recycle, and reuse nanoparticles, some of which ounce for ounce can be more precious than gold. The method, which offers a solution to a nagging problem, could speed application of nanotechnology in new generations of solar cells, flexible electronic displays, and other products, the scientists suggest.

Posted: Apr 14th, 2010

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Einblick in die Nanowelt - das Unsichtbare sichtbar machen

Die Friedrich-Alexander Universitaet Erlangen-Nuernberg bekommt ein neues 'Auge', mit dem Wissenschaftler die Wunderwelt von Nanomaterialen untersuchen koennen: Am 30. April 2010 weiht die Universitaet das Transmissionselektronenmikroskop TITAN3 und das eigens dafuer errichtete Gebaeude in einem Festakt offiziell ein.

Posted: Apr 14th, 2010

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New detector counts photons with 99 percent efficiency

Scientists at the National Institute of Standards and Technology (NIST) have developed the world's most efficient single photon detector, which is able to count individual particles of light traveling through fiber optic cables with roughly 99 percent efficiency.

Posted: Apr 14th, 2010

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Printed origami offers new technique for complex structues

Although it looks small and unassuming, the tiny origami crane sitting in a sample dish in University of Illinois professor Jennifer Lewis' lab heralds a new method for creating complex three-dimensional structures for biocompatible devices, microscaffolding and other microsystems.

Posted: Apr 14th, 2010

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eBeam Initiative members publish collaborative results at Photomask Japan 2010

The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010 - one of the world's premier symposia for advanced lithography mask technology.

Posted: Apr 14th, 2010

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