Posted: April 21, 2008

Basics and applications of particle characterizations

(Nanowerk News) Basics and Applications of Particle Characterizations is one of eight short courses that the American Filtration and Separation Society (AFS) will be offering during its 21st Annual Conference being held May 19-22 in Valley Forge, Pennsylvania.
Basics and Applications of Particle Characterizations is an eight hour course that is being held 8:00 am to 5:00 pm on May 19th. Attendees are awarded a certificate with .8 CEUs.
This course will be of interest to scientists and engineers who want to improve their characterization and data interpretation skills for better particle separation, control of particulates, particulate formulation, suspensions, and dispersions. Given the wide range of technologies available for particle size and shape characterization, selection of the best technology for a particular application is not a trivial task. This short course will cover the basics of particle size (from nanoscale to millimeters) characterization along with several commercially available technologies. Participants will acquire the knowledge necessary for proper instrument selection and data validation and interpretation.
For registration and more information go to
Remi Trottier and Stewart Wood are the instructors for the course.
Remi Trottier has 15 years of experience in particle characterization. He is a senior specialist in the analytical laboratory at The Dow Chemical Company and is currently involved with several method development projects using various particle characterization technologies. Prior to joining Dow, Dr. Trottier supervised the physical measurements group within the Analytical Chemistry Division at the Alcoa Technical Center where he developed several particle sizing methods.
Stewart Wood is a research chemist in the Analytical Sciences Laboratory at The Dow Chemical Company in Midland, Michigan. For the past 21 years, he has been involved with developing and implementing, on a global basis for Dow, particulate characterization technologies, such as hydrodynamic chromatography, laser Doppler anemometry, light obscuration, photosedimentometry, and dynamic image analysis.
Following the AFS short courses is the AFS 21st Annual Conference that consists of dozens of technical presentations on filtration and separation. The conference runs May 20-22.
For information on the AFS 21st Annual Technical Conference go to
For information on other course offerings go to
AFS is the premier organization in North America dedicated to R&D, problem solutions and technology transfer in filtration and separation for the benefit of industrial processes, individual health and a clean environment.
The AFS conferences and events bring together the industry leaders, presenting the greatest opportunity to meet and hear the newest information in filtration and separation technology.
Over the past two years over 300 organizations have sent representatives to AFS events. These companies understand the value of employees with knowledge of the latest information in filtration and separation technology.
For information on AFS go to
Contact Information:

Suzanne Sower

American Filtration and Separations Society

7608 Emerson Ave S.

Richfield, MN 55423

Phone: 612-861-1277

Fax: 612-861-7959

Source: American Filtration and Separations Society
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