A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to conventional top-down fabrication techniques.
New research findings substantially improve the yields in the fabrication of devices with molecular monolayers active channels and significantly reduce the density of defects caused by metal penetration.
Researchers from the Samsung Advanced Institute of Technology (SAIT) in Korea report a direct photolithographic route to selective growth of single-walled carbon nanotubes (SWNTs).