Organic semiconductors expert appointed Fellow of APS
Professor Franco Cacialli has become a fellow of the American Physical Society upon the recommendation of the Division of Materials Physics.
Nov 23rd, 2009
Read moreProfessor Franco Cacialli has become a fellow of the American Physical Society upon the recommendation of the Division of Materials Physics.
Nov 23rd, 2009
Read moreScientists at the Carnegie Institution have found for the first time that high pressure can be used to make a unique hydrogen-storage material. The discovery paves the way for an entirely new way to approach the hydrogen-storage problem.
Nov 22nd, 2009
Read moreEver wonder what something looks like up close and personal? ASPEX wants your samples! ASPEX, makers of the Personal Scanning Electron Microscope (PSEM), kicked off its 'Send Us Your Sample' campaign, encouraging people to send in samples to be scanned by one of their PSEMs.
Nov 20th, 2009
Read moreThe University of California Board of Regents on Nov. 19 named Paul Alivisatos director of the Department of Energy's Lawrence Berkeley National Laboratory, which is managed by the university.
Nov 20th, 2009
Read moreEnergieeffiziente und umweltfreundliche Technologien ruecken immer mehr in den Mittelpunkt. Welchen Beitrag die Mikro- und Nanotechnologie dabei leisten kann, zeigt eine Veranstaltung am 1. Dezember in Dortmund auf.
Nov 20th, 2009
Read moreTo develop tools for tracking histone acetylation in live cells, Minoru Yoshida of the RIKEN Advanced Science Institute in Wako paired his knowledge of histone acetylation with colleague Kazuki Sasaki's expertise in fluorescent biosensor design.
Nov 20th, 2009
Read moreStanislaus S. Wong, a scientist with a joint appointment at the U.S. Department of Energy's Brookhaven National Laboratory and Stony Brook University, has won the Buck-Whitney Award from the American Chemical Society (ACS) Eastern New York Section.
Nov 20th, 2009
Read morePhysikern der Empa ist es zusammen mit Chemikern des Max-Planck-Instituts fuer Polymerforschung nun erstmals gelungen, ein graphenaehnliches Polymer mit atomarer Genauigkeit zu synthetisieren.
Nov 20th, 2009
Read morePhysicists at UC Santa Barbara have made an important advance in electrically controlling quantum states of electrons, a step that could help in the development of quantum computing.
Nov 20th, 2009
Read moreScientists at the University of Michigan have determined the atomic-level, three-dimensional structure of a SEVI precursor known as PAP248-286 and discovered how it damages cell membranes to make them more vulnerable to infection with HIV.
Nov 19th, 2009
Read moreVibrations in nanostructures offer applications in molecular-scale biological sensing and ultrasensitive mass detection. To approach single-atom sensing, it is necessary to reduce the dimensions of the structures to the nanometer scale while preserving long-lived vibrations.
Nov 19th, 2009
Read moreTogether with colleagues from the Max Planck Institute for Polymer Research in Mainz, scientists from Empa's nanotech@surfaces laboratory have for the first time succeeded in synthesizing a graphene-like polymer with well defined pores
Nov 19th, 2009
Read moreAsylum Research, the technology leader in Scanning Probe and Atomic Force Microscopy (SPM/AFM), has announced a new grant program for early adopters to explore the capabilities and applications of the unique new Band Excitation technique. Existing or new Asylum AFM users are encouraged to apply for grants valued at up to $50,000 USD.
Nov 19th, 2009
Read moreMost people would like to be able to charge their cell phones and other personal electronics quickly and not too often. A recent discovery made by UC San Diego engineers could lead to carbon nanotube-based supercapacitors that could do just this.
Nov 19th, 2009
Read moreThe atomic-level action of a remarkable class of ring-shaped protein motors has been uncovered by researchers with the Lawrence Berkeley National Laboratory (Berkeley Lab) using a state-of-the-art protein crystallography beamline at the Advanced Light Source
Nov 19th, 2009
Read moreToshiba Corporation has announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.
Nov 19th, 2009
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